2020年第67回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

16 非晶質・微結晶 » 16.3 シリコン系太陽電池

[12p-A403-1~15] 16.3 シリコン系太陽電池

2020年3月12日(木) 13:15 〜 17:30 A403 (6-403)

大平 圭介(北陸先端大)、兼松 大二(パナソニック)、宮島 晋介(東工大)

16:30 〜 16:45

[12p-A403-12] Effect of the tunnel oxide/AlOx stacked hole-selective contacts on the junction properties at PEDOT:PSS/n-type Si interface

〇(D)Md Enamul Karim1、Arifuzzaman Rajib1、Yuki Nasuno1、Tomofumi Ukai2、Shunji Kurosu2、Masahide Tokuda2、Yasuhiko Fujii2、Tatsuro Hanajiri2、Ryo Ishikawa1、Keiji Ueno1、Hajime Shirai1 (1.Saitama University、2.Toyo University)

キーワード:ALD-Al2O3, XPS

Dopant-free carrier selective layer has attracted interest in the filed of Si photovoltaics. So far, we investigated the PEDOT: PSS/n-Si heterojunction solar cells using spin coat and chemical mist deposition (CMD) with a spin-coated carrier selective layer. However, the passivation quality at the PEDOT:PSS/n-Si contacts is still not clear including the junction properties. In this study, we investigated the effect of the tunnel oxide/AlOx stacked hole-selective contacts on the junction properties at the PEDOT: PSS/n-type Si interface.