11:15 〜 11:30
▲ [13a-A403-8] Development of Double-sided TOPCon Solar Cells on Textured Silicon Wafer using ALD-SiOx
キーワード:Passivated contact, Polycrystalline silicone, Atomic layer deposition
Double-sided, front and rear, thin oxide passivated contact (TOPCon) solar cells are developed on textured silicon wafers. The double-sided TOPCon structure is composed of (p) poly-Si/SiOx/(n) c-Si/SiOx/(n) poly-Si, where the ultrathin oxide (SiOx), about 0.6 ± 0.1 nm, is deposited by ALD. A photoconversion efficiency (PCE) of 18.8 % is obtained with the short-circuit current measured above 39 mA/cm2 for a front Ag grid structure. The performances are successfully improved by controlling the boron and hydrogen diffusion profiles near the p-side SiOx/c-Si.