Thickness dependence of X-ray-induced optical absorption in fused quartz

Akihiro Haruki; Yamaguchi Keisuke; Kuzuu Nobu; Horikoshi Hideharu

Presentation information

Poster presentation

16 Amorphous and Microcrystalline Materials » 16.1 Fundamental properties, evaluation, process and devices in disordered materials

[13a-PB2-1~7] 16.1 Fundamental properties, evaluation, process and devices in disordered materials

Fri. Mar 13, 2020 9:30 AM - 11:30 AM PB2 (PB)

9:30 AM - 11:30 AM

[13a-PB2-3] Thickness dependence of X-ray-induced optical absorption in fused quartz

〇Akihiro Haruki¹, Yamaguchi Keisuke¹, Kuzuu Nobu¹, Horikoshi Hideharu² (1.Fukui Univ, 2.Tosoh SGM)

Keywords:Amorphous

X-rays induced absorption bands if fused silica was investigated for clarify the charachteristics of defect structures. In this study, irrdatiation time dependence of the intensities of x-ray-induced absorption bands derived from defect structures in fused quartz was investigated.