[13p-A305-1~13] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

△ [13p-A305-13] Normally-off Sputtered MoS₂-nMISFETs for Large Scale Integration

〇kentarou matsuura¹, Masaya Hamada¹, Takuya Hamada¹, Haruki Tanigawa¹, Takuro Sakamoto¹, Atsushi Hori¹, Iriya Muneta¹, Takamasa Kawanago¹, Kuniyuki Kakushima¹, Kazuo Tsutsui¹, Atsushi Ogura², Hitoshi Wakabayashi¹ (1.TokyoTech, 2.Meiji Univ.)

Keywords:Two dimensional semiconductor, Normally-off, Sputtering