2020年第67回応用物理学会春季学術講演会

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6 薄膜・表面 » 6.4 薄膜新材料

[13p-D221-1~14] 6.4 薄膜新材料

2020年3月13日(金) 13:45 〜 18:30 D221 (11-221)

土屋 哲男(産総研)、西川 博昭(近畿大)、大友 明(東工大)

17:00 〜 17:15

[13p-D221-9] Crystallographic Anisotropy in Physical Properties of Ta3N5 Epitaxial Thin Films

Yannan Wang1、Takuto Wakasugi1、Yasushi Hirose1、Yuji Masubuchi2、Yuki Sugisawa3、Daiichiro Sekiba3、Tetsuya Hasegawa1 (1.Univ. of Tokyo、2.Hokkaido Univ.、3.Univ. of Tsukuba)

キーワード:Ta3N5, epitaxial thin film, photocatalytic material

Hydrogen generation by photocatalytic overall water splitting shows great potential in solving environmental problems resulted from the overuse of fossil fuels. Ta3N5 is a promising material that has nearly ideal bandgap (2.1eV) and band-edge positions for photocatalytic water splitting. In this study, epitaxial thin films of Ta3N5 were synthesized unprecedentedly and crystallographic anisotropy in the physical properties of the films was investigated. Optical reflection spectra of the epitaxial Ta3N5 thin films evaluated with linearly polarized light showed clear anisotropy in absorption edge, which agreed well with the theoretical prediction.