The 67th JSAP Spring Meeting 2020

Presentation information

Poster presentation

13 Semiconductors » 13.7 Compound and power electron devices and process technology

[13p-PA9-1~25] 13.7 Compound and power electron devices and process technology

Fri. Mar 13, 2020 4:00 PM - 6:00 PM PA9 (PA)

4:00 PM - 6:00 PM

[13p-PA9-17] Ohmic characteristics to n-AlN using AlGaN contact layers varied degree of compositional graduation

Masanobu Hiroki1, Kazuhide Kumakura1 (1.NTT BRL)

Keywords:AlN

We obtained ohmic contact to n-type AlN using graded-AlGaN contact layer. In this study, we tried to improve ohmic characteristics by structural modification of the graded-AlGaN contact layer. As a result, current density was about 2 times larger than that for previous works. We also found the reduction in the effective contact resistivity from TLM measurements.