3:15 PM - 3:30 PM
[14p-A303-7] Observation of (Hf,Zr)O2 thin films by scanning nonlinear dielectric microscopy
Keywords:HfO2, polarization fatigue, scanning nonlinear dielectric microscopy
Ferroelectric HfO2 is one of the most promising candidate for ultra-high density FeRAMs. However, polarization fatigue still remains an issue to be addressed. Nanoscale investigation of polarization switching can help to understand and overcome the fatigue. In this study, polarization switching in (Hf,Zr)O2 thin films is observed by scanning nonlinear dielectric microscopy and will discuss the fatigue behavior.