2020年第67回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

3 光・フォトニクス » 3.15 シリコンフォトニクス・集積フォトニクス

[14p-B508-1~8] 3.15 シリコンフォトニクス・集積フォトニクス

2020年3月14日(土) 15:45 〜 18:00 B508 (2-508)

荒川 太郎(横国大)、北 智洋(早大)

16:15 〜 16:30

[14p-B508-3] High-frequency Response of Si-SET: Experimental Verification

〇(D)Alka Singh1、Tomoki Nishimura2、Hiroaki Satoh2,3、Hiroshi Inokawa1,2,3 (1.GSST, Shizuoka Univ.、2.GSIST, Shizuoka Univ.、3.RIE, Shizuoka Univ.)

キーワード:Si- Single Electron Transistors, High-frequency, Rectifier

It has been observed that there is no upper limit of frequency in the rectifying operation od single-electron transistors (SETs). Theoretical explanation behind this is that the asymmetry in the tunneling rate with respect to drain voltage is responsible for asymmetry in the drain current, resulting in rectification even at higher frequency beyond the conventional cutoff frequency. Here, the details of ongoing experimental verification are reported.