[14p-PB8-1~8] 13.2 Exploratory Materials, Physical Properties, Devices

[14p-PB8-5] Employment of Template Layer for Fabrication of Iron Oxide Film on Si Substrate

〇Kenta Yamanaka^1,2, Kenji Yamaguchi^2,1 (1.Ibaraki Univ., 2.QST)

Keywords:semiconductor, thin films, sputter deposition