[15a-PA5-1~25] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[15a-PA5-18] Crystallinity and physical property evaluations of epitaxial NiO thin films prepared by using mist CVD method

〇Akito Igarashi¹, Chinami Hoshino¹, Kentaro Kinoshita¹ (1.Tokyo Univ. of Sci.)

Keywords:Epitaxial thin film, mist CVD