Precise measurement of the temperature of a silicon wafer by an optical-interference contactless thermometer during rapid plasma processing

9:30 AM - 11:30 AM

[15a-PB2-22] Precise measurement of the temperature of a silicon wafer by an optical-interference contactless thermometer during rapid plasma processing

〇(M2)Asaki Kameda¹, Yuri Mizukawa¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.ADSM, Hiroshima Univ.)

Keywords:Substrate temperature, Plasma processing, temperature monitoring

プラズマプロセスにおいて正確にウェハ温度を測定することは様々な要因により困難である.本研究では独自に開発した光学干渉非接触温度計(Optical-Interference Contactless Thermometer: OICT) に着目し, そのプラズマプロセス応用を目指した.