GE BEIBEI

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 1:30 PM - 5:30 PM N102 (Oral)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-N102-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:30 PM - 4:45 PM

▲ [12p-N102-12] Low Temperature and High-Quality Neutral Beam Enhanced Atomic Layer Deposition of Hafnium Dioxide

〇(M2C)GE BEIBEI¹, Daisuke Ohori¹, Hua Hsuan Chen³, Takuya Ozaki¹, Kazuhiko Endo⁴, Seiji Samukawa^1,2,3 (1.IFS, Tohoku Univ., 2.AIMR, Tohoku Univ, 3.NYCU, 4.AIST)

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