Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Sun. Sep 12, 2021 1:30 PM - 5:30 PM N102 (Oral)
Kosuke Takenaka(Osaka Univ.), Hiroki Kondo(Nagoya Univ.)
△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above
1:30 PM - 1:45 PM
〇(M2)Takuro Sekido1, Takuhiro Ando1, Hiroaki Kakiuchi1, Hiromasa Ohmi1 (1.Osaka Univ.)
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1:45 PM - 2:00 PM
〇Masato Nakayama1, Masato Sakaguchi1, Kato kiyotaka2, Yuichiro Kuroki1 (1.Salesian Polytechnic, 2.Surfclean Inc.)
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2:00 PM - 2:15 PM
〇(M1)Yoshito Manabe1, Kaishu Imanaka1, Tatsuru Shirafuji1, Jun-Seok Oh1 (1.Osaka City Univ.)
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2:15 PM - 2:30 PM
〇(M1)Koki Sasaki1, Yudai Nishimura1, Jun-Seok Oh1, Tatsuru Shirafuji1 (1.Osaka City Univ.)
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2:30 PM - 2:45 PM
〇Yuma Habu1, Junki Hayashi1, Kenta Nagai1, Misao Kiga1, Teruya Yamada1, Giichiro Uchida1,2 (1.Meijo Univ., 2.Ene.Inst.Meijo Univ.)
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2:45 PM - 3:00 PM
〇Junki Hayashi1, Kenta Nagai1, Yuma Habu1, Misao Kiga1, Teruya Yamada1, Giichiro Uchida1,2 (1.Meijo Univ., 2.Ene. Inst. Meijo Univ.)
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3:00 PM - 3:15 PM
〇Misao Kiga1, Yuma Habu1, Junki Hayashi1, Kenta Nagai1, Teruya Yamada1, Giichiro Uchida1,2 (1.Meijo Univ., 2.Ene.Inst.Meijo Univ.)
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3:30 PM - 3:45 PM
〇(D)Takayuki Matsuda1, Takashi Hamano1, Yuya Asamoto1, Masao Noma2, Michiru Yamashita3, Shigehiko Hasegawa4, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ., 2.SHINKO SEIKI. Co., LTD., 3.Hyogo Prefectural Inst., of Technol., 4.Osaka Univ.)
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3:45 PM - 4:00 PM
〇Yuya Asamoto1, Takayuki Matsuda1, Takashi Hamano1, Masao Noma2, Shigehiko Hasegawa3, Michiru Yamashita4, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ., 2.SHINKO SEIKI, 3.Osaka Univ., 4.Hyogo Pref. Inst. Tech.)
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4:00 PM - 4:15 PM
〇Hiromichi Nakatsuka1, Rei Tanaka1, Hiroaki Kakiuchi1, Hiromasa Ohmi1 (1.Osaka Univ.)
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4:15 PM - 4:30 PM
〇Hiroki Kondo1, Kiyoshi Kuwahara2, Dhasiyan Arun Kumar1, Masaru Hori1 (1.Nagoya Univ. Low-temp. Plasma, 2.KATAGIRI Eng.)
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4:30 PM - 4:45 PM
〇(M2C)GE BEIBEI1, Daisuke Ohori1, Hua Hsuan Chen3, Takuya Ozaki1, Kazuhiko Endo4, Seiji Samukawa1,2,3 (1.IFS, Tohoku Univ., 2.AIMR, Tohoku Univ, 3.NYCU, 4.AIST)
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4:45 PM - 5:00 PM
〇Hansin BAE1, Hamaguchi Ikumi1, Kensuke Sasai2, Haruka Suzuki1,2, Hirotaka Toyoda1,2,3 (1.Nagoya Univ., 2.Nagoya Univ. cLPS, 3.NIFS)
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5:00 PM - 5:15 PM
〇(M2)Jumpei Kurokawa1, Tadashi Mitsunari2,3, Takayoshi Tsutsumi3, Hiroki Kondo3, Makoto Sekine3, Kenji Ishikawa3, Masaru Hori3 (1.Nagoya Univ. Eng., 2.Tokyo Electron Technology Solutions, 3.Nagoya Univ. Center for Low-temperature Plasma Science)
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5:15 PM - 5:30 PM
〇(M2)Taishi Nojima1, Hiroaki Hanafusa1, Takuma Sato1, Seiichiro Higashi1 (1.Hiroshima Univ.)
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