Yuya Asamoto

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 1:30 PM - 5:30 PM N102 (Oral)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-N102-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:45 PM - 4:00 PM

△ [12p-N102-9] Control of Ion Flux to the Substrate in Material Processing with a Vacuum-Arc Discharge Considering Discharge Current Limitation Mechanisms

〇Yuya Asamoto¹, Takayuki Matsuda¹, Takashi Hamano¹, Masao Noma², Shigehiko Hasegawa³, Michiru Yamashita⁴, Keiichiro Urabe¹, Koji Eriguchi¹ (1.Kyoto Univ., 2.SHINKO SEIKI, 3.Osaka Univ., 4.Hyogo Pref. Inst. Tech.)

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