Taishi Nojima

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 1:30 PM - 5:30 PM N102 (Oral)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-N102-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:15 PM - 5:30 PM

[12p-N102-15] Study on growth of high crystalline silicon film by instantaneous heating during deposition of silicon film by plasma CVD

〇(M2)Taishi Nojima¹, Hiroaki Hanafusa¹, Takuma Sato¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)