Jumpei Kurokawa

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 1:30 PM - 5:30 PM N102 (Oral)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12p-N102-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:00 PM - 5:15 PM

△ [12p-N102-14] Effect of hydrogen flow ratio on film properties of amorphous carbon deposited by C₃H₆ / H₂ plasma

〇(M2)Jumpei Kurokawa¹, Tadashi Mitsunari^2,3, Takayoshi Tsutsumi³, Hiroki Kondo³, Makoto Sekine³, Kenji Ishikawa³, Masaru Hori³ (1.Nagoya Univ. Eng., 2.Tokyo Electron Technology Solutions, 3.Nagoya Univ. Center for Low-temperature Plasma Science)