Tomoya Sawafuji

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 1:30 PM - 5:15 PM N304 (Oral)

Oral presentation
| 13 Semiconductors
| 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[12p-N304-1~14] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

4:45 PM - 5:00 PM

[12p-N304-13] Bromine concentration dependence of neutral electroless copper plating rate

〇Tomoya Sawafuji¹, Osamu Sugiura¹ (1.Chiba Inst. of Tech.)