Reki Fujiwara

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Speaker, Author, Co-Author

Fri. Sep 10, 2021 9:00 AM - 11:30 AM N402 (Oral)

Oral presentation
| CS Code-sharing session
| 【CS.1】 Code-sharing Session of 2.3 & 7.5

[10a-N402-1~9] CS.1 Code-sharing Session of 2.3 & 7.5

9:15 AM - 9:30 AM

[10a-N402-2] Atomic Layer Etching of SiO₂ by Ar-GCIB irradiation on organic acid adsorbed surface

〇(M1)Reki Fujiwara¹, Masaya Takeuchi¹, Noriaki Toyoda¹ (1.Univ. of Hyogo)