Kazuya Okada

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Speaker, Author, Co-Author

Fri. Sep 10, 2021 1:30 PM - 6:30 PM N202 (Oral)

Oral presentation
| 15 Crystal Engineering
| 15.5 Group IV crystals and alloys

[10p-N202-1~19] 15.5 Group IV crystals and alloys

3:30 PM - 3:45 PM

[10p-N202-9] Fabrication of strain-relaxed SiGe buffer layer on Si (111) and annealing effect

〇Kazuya Okada¹, Youya Wagatsuma¹, Kodai Yamada¹, Takahiro Inoue¹, Kentarou Sawano¹ (1.Tokyo City Univ.)