Yuika Takizawa

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Speaker, Author, Co-Author

Fri. Sep 10, 2021 1:00 PM - 5:00 PM S202 (Oral)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[10p-S202-1~14] 15.6 Group IV Compound Semiconductors (SiC)

4:45 PM - 5:00 PM

[10p-S202-14] SiC CVD reactor cleaning using low concentration ClF3 gas

Takumi Mamyouda¹, 〇Yuika Takizawa¹, Hitoshi Habuka¹, Akio Ishiguro², Shigeaki Ishii², Yoshiaki Daigo², Hideki Ito², Ichiro Mizushima², Yoshinao Takahashi³ (1.Yokohama National Univ., 2.NuFlare Technology, 3.KANTO DENKA KOGYO)

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