Masakazu Tanuma

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Speaker, Author, Co-Author

Sat. Sep 11, 2021 9:00 AM - 12:00 PM N205 (Oral)

Oral presentation
| CS Code-sharing session
| 【CS.9】 Code-sharing Session of 6.1 & 13.3 & 13.5

[11a-N205-1~11] CS.9 Code-sharing Session of 6.1 & 13.3 & 13.5

9:15 AM - 9:30 AM

[11a-N205-2] Investigation of suppression of SiO₂ interfacial layer formation during ferroelectric non-doped HfO₂ formation

〇Masakazu Tanuma¹, Joong-Won Shin¹, Shun-ichiro Ohmi¹ (1.Tokyo Inst. of Technology)