JoongWon Shin

→ Search for JoongWon Shin in Google Scholar

Speaker, Author, Co-Author

Sat. Sep 11, 2021 9:00 AM - 12:00 PM N205 (Oral)

Oral presentation
| CS Code-sharing session
| 【CS.9】 Code-sharing Session of 6.1 & 13.3 & 13.5

[11a-N205-1~11] CS.9 Code-sharing Session of 6.1 & 13.3 & 13.5

9:30 AM - 9:45 AM

▼ [11a-N205-3] The effect of sputtering power for Pt gate electrode deposition on the ferroelectric property of 5 nm thick undoped HfO₂

〇JoongWon Shin¹, Masakazu Tanuma¹, Shun-ichiro Ohmi¹ (1.Tokyo Inst. of Technology)