Takashi Onaya

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Speaker, Author, Co-Author

Sat. Sep 11, 2021 9:00 AM - 12:00 PM N205 (Oral)

Oral presentation
| CS Code-sharing session
| 【CS.9】 Code-sharing Session of 6.1 & 13.3 & 13.5

[11a-N205-1~11] CS.9 Code-sharing Session of 6.1 & 13.3 & 13.5

10:15 AM - 10:30 AM

[11a-N205-6] Suppression of SiO₂ interfacial layer growth for TiN/Hf_xZr_1−xO₂/Si-MFS fabrication

〇(PC)Takashi Onaya^1,2,3, Toshihide Nabatame², Mari Inoue², Tomomi Sawada², Hiroyuki Ota¹, Yukinori Morita¹ (1.AIST, 2.NIMS, 3.JSPS Research Fellow PD)