Ryota Koitabashi

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Speaker, Author, Co-Author

Sat. Sep 11, 2021 9:00 AM - 12:00 PM N304 (Oral)

Oral presentation
| 13 Semiconductors
| 13.2 Exploratory Materials, Physical Properties, Devices

[11a-N304-1~11] 13.2 Exploratory Materials, Physical Properties, Devices

10:45 AM - 11:00 AM

△ [11a-N304-7] Impact of Ba/Si deposition rate ratios during RF sputtering on the characteristics of BaSi₂ films on glass substrates

〇Ryota Koitabashi¹, Hayato Hasebe¹, Masami Mesuda², Kaoru Toko¹, Takashi Suemasu¹ (1.Univ. Tsukuba, 2.Tosoh Corporation)