Yukiharu Uraoka

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Speaker, Author, Co-Author

Sat. Sep 11, 2021 9:00 AM - 11:40 AM S301 (Oral)

Symposium (Oral)
| Symposium
| Atomic layer processes for future device fabrication; Understanding surface reaction dynamics and its control

[11a-S301-1~7] Atomic layer processes for future device fabrication; Understanding surface reaction dynamics and its control

9:40 AM - 10:10 AM

[11a-S301-3] Basics of ALD (Atomic Layer Deposition) and application to semiconductor devices

〇Yukiharu Uraoka¹, Mutsunori Uenuma¹ (1.NAIST)