Kazumasa Nemoto

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 1:00 PM - 4:15 PM N323 (Oral)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[12p-N323-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

4:00 PM - 4:15 PM

[12p-N323-11] Wet cleaning to reduce particles generated on a wafer in closed environment

〇Kazumasa Nemoto¹, Takashi Yajima¹, Miura Noriko², Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.Minimal Fab)