Noriko Miura

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 1:00 PM - 4:15 PM N323 (Oral)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[12p-N323-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

1:15 PM - 1:30 PM

[12p-N323-2] Gap Fill characteristics of Minimal Plasma TEOS Film for Inter metal layer

〇Noriko Miura¹, Hiroyuki Tanaka², Shuichi Noda², Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.MINIMAL, 2.AIST)