1:15 PM - 1:30 PM [13p-S301-2] Fabrication and structural analysis of a-SiCNx:H films from the decomposition of organosilicon compound induced by the microwave plasma of N2 〇Tsubasa Takai1, Haruhiko Ito1, Tsuneo Suzuki1 (1.Nagaoka Univ. of Tech)