[10a-S301-1~10] 8.1 Plasma production and diagnostics

△ [10a-S301-2] Electron temperature, density, and energy distribution function diagnostics of the argon low pressure argon plasma generated by an etching unit based on optical emission spectroscopic measurement

〇Yuya Yamashita¹, Takuya Akiba¹, Toshihide Iwanaga¹, Shuichi Date¹, Yamaoka Hidehiko¹, Hiroshi Akatsuka² (1.TIRI, 2.Tokyo Tech)

Keywords:collisional-radiative model, processing plasma, in situ measurement

Electron temperature T_e, density N_e, and energy distribution function (EEDF) of the argon low pressure inductively coupled plasma generated by an etching unit were diagnosed by optical emission spectroscopic measurement. In order to reduce diagnostic errors, the dependence of reduced population density distribution on T_e, N_e, and EEDF was surveyed. The excitation levels which used for diagnosis were selected based on the survey result. The diagnosis was based on fitting reduced population densities with calculated value by collisional-radiative model and experimental value by OES measurement of emission lines which upper levels were 4p[1/2]₁, 4p’[3/2]₁, 4p[1/2]₀, and 4p’[1/2]₀.