[10p-N104-1~18] 16.3 Bulk, thin-film and other silicon-based solar cells

[10p-N104-11] Impact of hydrogen plasma treatment temperature on carrier selectivity of silicon nano-crystal/silicon oxide compound layer

〇Masashi Matsumi¹, Kazuhiro Gotoh¹, Markus Wilde², Yasuyoshi Kurokawa¹, Katsuyuki Fukutani², Noritaka Usami¹ (1.Graduate School of Eng., Nagoya Univ, 2.Institute of Industrial Sci., The Univ. of Tokyo)

Keywords:New passivation layer, Hydrogen plasma treatment, Carrier selectivity