The 82nd JSAP Autumn Meeting 2021

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Oral presentation

15 Crystal Engineering » 15.5 Group IV crystals and alloys

[10p-N202-1~19] 15.5 Group IV crystals and alloys

Fri. Sep 10, 2021 1:30 PM - 6:30 PM N202 (Oral)

Masashi Kurosawa(Nagoya Univ.), Kaoru Toko(Univ. of Tsukuba)

3:30 PM - 3:45 PM

[10p-N202-9] Fabrication of strain-relaxed SiGe buffer layer on Si (111) and annealing effect

〇Kazuya Okada1, Youya Wagatsuma1, Kodai Yamada1, Takahiro Inoue1, Kentarou Sawano1 (1.Tokyo City Univ.)

Keywords:SiGe