The 82nd JSAP Autumn Meeting 2021

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[10p-N323-1~12] 13.3 Insulator technology

Fri. Sep 10, 2021 1:00 PM - 4:15 PM N323 (Oral)

Keisuke Yamamoto(Kyushu Univ.), Yuuichiro Mitani(Tokyo City University)

2:15 PM - 2:30 PM

▲ [10p-N323-6] Evaluation of electron and hole slow trap density in Al2O3/GeOx/p-Ge gate stacks by C-V measurements

〇Mengnan Ke1, Takenaka Mitsuru2, Shinichi Takagi2 (1.Tokyo Univ. of Sci., 2.Univ. of Tokyo)

Keywords:Germanium, MOS interfaces, slow trap