[10p-S203-1~21] 6.3 Oxide electronics

[10p-S203-20] Low temperature crystallization of transparent conductor Nb-doped TiO₂ thin film on Al-based alloy substrates

〇(M2)Tomoki Masuyama¹, Ryota Shimizu¹, Taro Hitosugi¹ (1.Tokyo tech)

Keywords:Transparent Conductive Oxide, thin film, Titanium dioxide

Transparent conductor Nb-doped TiO₂ (TNO) thin film, is expected to be used as a substitute material for ITO and as a low-cost protective film against corrosion because of its high corrosion resistance and the low cost of raw materials. However, one of the challenges for practical use is the high crystallization temperature (∼340℃ on a glass substrate). In this study, we have attempted low temperature crystallization of TNO thin film as a protective film for Al-based alloys, and have succeeded in achieving low-temperature crystallization at 250℃.