[11a-N105-1~5] Deciphering and designing the functional orders exhibiting specific and unique functions of non-crystalline and crystalline solids

[11a-N105-5] In-situ XRD observation of solid-state crystallization using 2D detector

〇Katsuhiko Inaba¹, Shintaro Kobayashi¹, Kazuhiko Ishikawa¹, Yutaka Furubayashi², Tetsuya Yamamoto² (1.Rigaku Corp., 2.Kochi Univ. Tech, Res. Inst.)

Keywords:X-ray diffraction, solid-phase crystallization, in situ observation

We have performed in-situ XRD measurements to analyze solid-phase crystallization processes by annealing in amorphous thin films. Amorphous ITO (Sn-doped In₂O₃) thin films with a thickness of 50 nm grown on glass substrates without heating by reactive plasma deposition were analyzed. In-situ XRD measurements on these samples were performed with SmartLab XRD apparatus equipped with a heating stage. Samples were heated uninterruptedly with a heating rate of 5 ℃/min, from room temperature to 300 ℃, and diffraction signals from samples were collected continuously on HyPix-3000 2D detector in a snapshot mode with exposure time of several seconds. Crystallization of ITO films were confirmed by detecting 222 reflection from ITO crystallites at 190 ℃.