[11a-N302-1~11] 17.3 Layered materials

△ [11a-N302-5] Fabrication of MoS₂ Films by Reactive Sputtering Method

〇(D)Myeongok Kim^1,2, Maxime Giteau¹, Naoya Miyashita¹, Yoshitaka Okada^1,2 (1.RCAST UTokyo, 2.Grad. School of Eng. UTokyo)

Keywords:MoS2, Reactive sputtering, Vertically aligned growth

In this research, MoS₂ thin films are fabricated by reactive sputtering. The films’ structural and morphological properties were characterized by XRD and cross-sectional SEM. On quartz and molybdenum (Mo) coated soda lime glass substrates, Mo from sputtering gun and sulfur from a hot lip cell were simultaneously supplied during the film fabrication. 2H-MoS₂ films were successfully formed without post treatment even at substrate temperature as low as 310^oC. Under this condition, the layered structure was vertically aligned to the substrate, and the vertical grain size was dependent on the partial pressure of sulfur during the fabrication.