[12a-N206-1~9] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[12a-N206-1] Electrical properties of NiO:Li epilayers grown by RF reactive magnetron sputtering

〇Yuya Hashimoto¹, Keisuke Nishimoto¹, Mutsumi Sugiyama^1,2 (1.Tokyo Univ. Sci., 2.RIST)

Keywords:NiO, Electrical properties, Sputtering