The 82nd JSAP Autumn Meeting 2021

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[12a-S203-1~9] 6.3 Oxide electronics

Sun. Sep 12, 2021 9:00 AM - 11:30 AM S203 (Oral)

Hiroyuki Yamada(AIST)

10:45 AM - 11:00 AM

[12a-S203-7] Synthesis of single-crystalline Sn2Nb2O7 thin films by pulsed laser deposition and Ti doping

Hiroaki Ito1, Takahiro Fujita1, Masashi Kawasaki1,2 (1.Univ. of Tokyo, 2.RIKEN CEMS)

Keywords:pulse laser deposition, Pyrochlore, Tin oxide

A pyrochlore oxide Sn2Nb2O7 is expected to have a ‘quasi flat band structure’ near Fermi level, which can be a source of intriguing physical properties such as ferromagnetism without magnetic elements when holes are heavily doped. We have prepared Sn2Nb2O7 thin films by pulsed laser deposition on Y-stabilized ZrO2(111) substrate by finding a growth window in low growth temperature (∼ 450 ℃) and higher laser fluence, possibly due to rather high volatility of stannous oxide. By Ti-doping, lattice constant shrinks due to the smaller Ti4+ ion compared with Nb5+. Optical measurements capture an absorption edge at $\sim$ 2.6 eV originating from the transition from the Sn-5s and O-2p hybridized valence band to Nb-4d conduction band, which are not observed in LiNbO3. Opposed to the expectation from the Burstein–Moss shift, Ti-doping results in reduction of the band gap indicating that the doping rather results in the formation of in-gap states and does not contribute to injecting mobile carriers.