[12p-N304-1~14] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

▲ [12p-N304-14] Quantitative evaluation on barrier property of ultra-thin PVD-Co(W) films against Cu diffusion by the time-lag method

〇(D)Yubin DENG¹, Taewoong Kim¹, Momoko Deura¹, Takeshi Momose¹, Akira Matsuo², Nobuo Yamaguchi², Yukihiro Shimogaki¹ (1.The Univ. of Tokyo, 2.CANON ANELVA CORP.)

Keywords:Barrier property, Quantitative evaluation