Preparation of VO<sub>2</sub> ultra-thin films on the hexagonal Boron Nitride and their thicknesses dependence of electrical properties

Boyuan Yu; Shingo Genchi; Mahito Yamamoto; Kenji Watanabe; Takashi Taniguchi; Yasukazu Murakami; Takehiro Tamaoka; Hidekazu Tanaka

講演情報

一般セッション(口頭講演)

6 薄膜・表面 » 6.3 酸化物エレクトロニクス

[13p-S203-1~15] 6.3 酸化物エレクトロニクス

2021年9月13日(月) 13:00 〜 17:00 S203 (口頭)

藤田貴啓(東大)、相馬拓人(東工大)

14:15 〜 14:30

▲ [13p-S203-6] Preparation of VO₂ ultra-thin films on the hexagonal Boron Nitride and their thicknesses dependence of electrical properties

〇(DC)Boyuan Yu¹、Shingo Genchi¹、Mahito Yamamoto²、Kenji Watanabe³、Takashi Taniguchi³、Yasukazu Murakami⁴、Takehiro Tamaoka⁴、Hidekazu Tanaka¹ (1.Sanken, Osaka Univ、2.Kansai Univ、3.NIMS、4.Kyushu Univ)

キーワード：VO2, h-BN, ultra-thin film

講演情報

[13p-S203-1~15] 6.3 酸化物エレクトロニクス

▲ [13p-S203-6] Preparation of VO2 ultra-thin films on the hexagonal Boron Nitride and their thicknesses dependence of electrical properties

▲ [13p-S203-6] Preparation of VO₂ ultra-thin films on the hexagonal Boron Nitride and their thicknesses dependence of electrical properties