Preparation of VO<sub>2</sub> ultra-thin films on the hexagonal Boron Nitride and their thicknesses dependence of electrical properties

Boyuan Yu; Shingo Genchi; Mahito Yamamoto; Kenji Watanabe; Takashi Taniguchi; Yasukazu Murakami; Takehiro Tamaoka; Hidekazu Tanaka

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[13p-S203-1~15] 6.3 Oxide electronics

Mon. Sep 13, 2021 1:00 PM - 5:00 PM S203 (Oral)

Takahiro Fujita(Univ. Tokyo), Takuto Soma(Tokyo Tech.)

2:15 PM - 2:30 PM

▲ [13p-S203-6] Preparation of VO₂ ultra-thin films on the hexagonal Boron Nitride and their thicknesses dependence of electrical properties

〇(DC)Boyuan Yu¹, Shingo Genchi¹, Mahito Yamamoto², Kenji Watanabe³, Takashi Taniguchi³, Yasukazu Murakami⁴, Takehiro Tamaoka⁴, Hidekazu Tanaka¹ (1.Sanken, Osaka Univ, 2.Kansai Univ, 3.NIMS, 4.Kyushu Univ)

Keywords:VO2, h-BN, ultra-thin film

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Presentation information

[13p-S203-1~15] 6.3 Oxide electronics

▲ [13p-S203-6] Preparation of VO2 ultra-thin films on the hexagonal Boron Nitride and their thicknesses dependence of electrical properties

▲ [13p-S203-6] Preparation of VO₂ ultra-thin films on the hexagonal Boron Nitride and their thicknesses dependence of electrical properties