[22a-P08-1~11] 8 Plasma Electronics(Poster)

[22a-P08-9] Computer Simulated Reproduction of Film Deposition Process for Improving the Functionality of Sputtering Formed Thin Films

〇(M2)Mizuki Kato¹, Satoshi Sugimoto¹, Masayuki Okugawa¹, Yuichiro Koizumi¹ (1.Osaka Univ.)

Keywords:plasma, Ar ion assist, Au thin film

For the sputtering-formed thin film, the effect of improving the functionality of the film by causing Ar+ bomberdment on the film surface has been found, but the understanding of the film formation process is not sufficient. In this study, we focused on the crystal orientation of the film due to the Ar+ assist effect and aimed to visualize the entire thin film formation process by comparing experiments and simulations. In the experiment, sputtering and Ar+ assist were performed and controlled using a bipolar low-frequency pulse power supply. The simulation used the molecular dynamics method.