3:00 PM - 4:40 PM
[22p-P04-5] Physical Vapor Deposition of Antireflection Thin Films Using a Low-Refractive-Index Fluoropolymer
Keywords:thin films, vacuum, optics
Thin films of TeflonTM AF were formed by vacuum deposition and electron assisted deposition. By forming the thin film on one side of the glass, the reflectance was reduced from a maximum of 8.2% to 4.8% in the visible region, and the refractive index of the film was as low as about 1.3. The optical properties of the films were not changed by electron beam irradiation. Pencil hardness test showed that the vacuum deposition films failed at 10B, while the electron-assisted deposition films endured up to 4B, showing an improvement in mechanical strength.