Takashi Hamano

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Speaker, Author, Co-Author

Wed. Mar 17, 2021 1:30 PM - 6:00 PM Z26 (Z26)

Oral presentation
| 13 Semiconductors
| 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[17p-Z26-1~15] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

2:45 PM - 3:00 PM

[17p-Z26-4] [The 12th Silicon Technology Division Young Researcher Award Speech] Model Prediction of Energy Profiles of Plasma Process-Induced Defects in Si Substrates Using Capacitance-Voltage Method

〇Takashi Hamano^1,2, Keiichiro Urabe¹, Koji Eriguchi¹ (1.Kyoto Univ., 2.JSPS Research Fellow)