RYOKO SUGANO

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Speaker, Author, Co-Author

Wed. Mar 17, 2021 9:00 AM - 11:45 AM Z03 (Z03)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17a-Z03-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:45 AM - 10:00 AM

[17a-Z03-4] Si-site Selective Removal from SiGe using Hydrogen Plasma via Ab-initio Calculations

〇RYOKO SUGANO¹, YOHEI ISHII², MAKOTO MIURA³, KENICHI KUWAHARA³ (1.Hitachi R&D Group, 2.Hitachi HTA, 3.Hitachi HT)