Taito Yoshie

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Speaker, Author, Co-Author

Wed. Mar 17, 2021 9:00 AM - 11:45 AM Z03 (Z03)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17a-Z03-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:00 AM - 10:15 AM

△ [17a-Z03-5] Behavior of active species in gas modulation cycle process using Ar/C₄F₈/SF

〇(M1)Taito Yoshie¹, Yasufumi Miyoshi², Takayoshi Tsutsumi¹, Katsuhisa Kugimiya², Kenji Ishikawa¹, Masaru Hori¹ (1.Nagoya Univ., 2.Sony Semiconductor Solutions Corp.)