Takuma Doi

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Speaker, Author, Co-Author

Thu. Mar 18, 2021 9:00 AM - 12:00 PM Z05 (Z05)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[18a-Z05-1~11] 15.6 Group IV Compound Semiconductors (SiC)

11:15 AM - 11:30 AM

△ [18a-Z05-9] Impact of interfacial layer insertion on Schottky barrier height of low work function metal/n-type 4H-SiC interface

〇Takuma Doi^1,2, Shigehisa Shibayama¹, Mitsuo Sakashita¹, Mitsuaki Shimizu², Osamu Nakatsuka^1,3 (1.Nagoya Univ., 2.AIST-NU GaN-OIL, 3.IMaSS, Nagoya Univ.)

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