Kento Ikeno

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Speaker, Author, Co-Author

Thu. Mar 18, 2021 1:30 PM - 5:15 PM Z24 (Z24)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18p-Z24-1~14] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

2:00 PM - 2:15 PM

[18p-Z24-3] Effects of sputter gas pressure on the formation of compressively strained SiGe thin film using sputter epitaxy method

〇Kento Ikeno¹, Yosuke Aoyagi², Nobumitsu Hirose³, Akifumi Kasamatsu³, Toshiaki Matsui³, Yoshiyuki Suda², Takahiro Tsukamoto¹ (1.Univ. Electro-Comm, 2.Tokyo Univ. of Agric. & Technol, 3.National Inst. of Information and Communications Technol)

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