Kana Onishi

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Speaker, Author, Co-Author

Fri. Mar 19, 2021 1:30 PM - 4:15 PM Z24 (Z24)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19p-Z24-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

3:15 PM - 3:30 PM

[19p-Z24-7] Minimal Fab metal film thickness tester by total X-ray reflection fluorescence

〇Kana Onishi¹, Hiroshi Nishizato¹, Tatsuya Hayashi¹, Wataru Sakai¹, Jun Hirose¹, Shuichi Noda², Hiroshige Kogayu³, Sommawan Khumpuang^2,3, Shiro Hara^2,3 (1.HORIBA STEC Co., Ltd., 2.AIST, 3.MINIMAL)

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