[16p-P12-1~4] 13.3 Insulator technology

[16p-P12-1] Dependence of penetration barrier of alkali metal ions into SiNx and SiOx films on ion radius

〇Tomoki Oku¹, Masahiro Totsuka¹, Hajime Sasaki¹ (1.Mitsubishi Electric)

Keywords:insulator film, alkali metal ions, penetration barrier

In the previous report, the smaller the ionic radius of the ion, the smaller the penetration barrier to the SiO2 and Si3N4 films tended to be. However, the cation did not have this tendency. In order to clarify the cause, the penetration barrier of alkali metal ions through the SiNx and SiOx films with defects was calculated. For alkali metal ions, the smaller the ionic radius, the easier it is not always to penetrate the films. The more easily penetrated ions differ depending on the film type and vacancies.