The 68th JSAP Spring Meeting 2021

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[16p-Z27-1~15] 15.4 III-V-group nitride crystals

Tue. Mar 16, 2021 1:00 PM - 5:15 PM Z27 (Z27)

Motoaki Iwaya(Meijo Univ.), Ryuji Katayama(Osaka Univ.), Tomoyuki Tanikawa(Osaka Univ.)

2:00 PM - 2:15 PM

[16p-Z27-5] Low voltage operation of AlGaN homo tunnel junction deep UV LED

Kengo Nagata1,2,3, Hiroaki Makino2, Hiroshi Miwa2,3, Shinichi Matsui2,3, Shinya Boyama2,3, Yoshiki Saito2,3, Maki Kushimoto1, Yoshio Honda4, Tetsuya Takeuchi5, Hiroshi Amano4,6,7 (1.Dept. of Electronics Nagoya Univ., 2.Toyoda Gosei Co., Ltd., 3.TS Opto Co., Ltd., 4.IMaSS, Nagoya Univ., 5.Meijo Univ., 6.ARC, Nagoya Univ., 7.VBL, Nagoya Univ.)

Keywords:UV LED, Tunnel junction, AlGaN

We produced an AlGaN homo TJ DUV LED by suppressing the C concentration in the TJ part and performing high Si doping. The characteristics of the manufactured TJ LED were Po = 31.4 mW, Vf = 10.4 V at 63 A / cm2, wavelength 283 nm, and the operating voltage was obtained lower than before. We considered the tunneling probability increases and contributes to low voltage operation owing to the depletion layer width reduction by doping high carrier concentration in top n-AlGaN and n+-AlGaN and the conduction through the defect levels.